Lattice Mismatched (Metamorphic) Triple Junction GaAs Epitaxial Wafer / Solar Cell

Power systems for multi-orbit spacecraft (LEO, GEO, IGSO, and deep space exploration).


Our 32% conversion efficiency solar cell is a next-generation upgrade over the mainstream 30% design. It employs metamorphic epitaxial growth utilizing high-precision MOCVD equipment. A strain-graded buffer layer enables low-dislocation InGaAs and GaInP subcells, while a novel wide-bandgap metamorphic tunnel junction provides an optimized bandgap configuration. These innovations deliver higher short-circuit current density and a record AM0 conversion efficiency of up to 33%.


Electrical Performance (@AM0, 135.3 mW/cm², 25°C, bare cell)

Parameter

Unit

100 mm (40mm×60mm)

100 mm (40mm×80mm)

Effmp

%

32.25

32.23

Voc

mV

2680

2680

Jsc

mA/cm²

19.02

19.00

Vmp

mV

2340

2340

Jmp

mA/cm²

18.56

18.54

Post Irradiation Performance (1 MeV electron fluence, e⁻/cm²)

Parameter

Radiation Intensity:1E+14

Radiation Intensity:1E+15

Effmp [%]

29.8

27.1

Vmp/Vmp,o

0.92

0.87

Jmp/Jmp,o

1.00

0.96

Pmp/Pmp,o

0.92

0.84

 


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