Lattice Matched Triple Junction GaAs Epitaxial Wafer / Solar Cell

Power systems for multi-orbit spacecraft (LEO, GEO, and IGSO).


Our 30% space solar cell adopts a GaInP/Ga(In)As/Ge triple-junction structure. High-quality lattice-matched epitaxy with a bandgap combination of three optical materials enables efficient use of the solar spectrum. It achieves a conversion efficiency up to 31.8%, nearly double that of standard silicon cells in space environments. GaAs-based materials provide superior radiation resistance, ensuring stable performance throughout long-duration space missions.

Electrical Performance (@AM0, 135.3 mW/cm², 25°C, bare cell)

Parameter

Unit

Value (Active Area:77.26 cm²)

Effmp

%

30.40

Voc

mV

2760

Jsc

mA/cm²

17.66

Vmp

mV

2420

Jmp

mA/cm²

16.96

Post Irradiation Performance (1 MeV electron fluence, e⁻/cm²)

Parameter

Radiation Intensity:1E+14

Radiation Intensity:1E+15

Effmp [%]

27.9

25.8

Vmp/Vmp,o

0.93

0.90

Jmp/Jmp,o

0.99

0.96

Pmp/Pmp,o

0.92

0.85


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